Al2O3/NiAl(110) 4 cycles NO2
Dataset Spectra
Photon energy 1486.61eV
Spectrum type C 1s
Resolution 10
Dwell Time 0.1
Step size 0.1
Number of scans 60
Sample Metadata
O
Al
Ni
Name Al2O3/NiAl(110) 4 cycles NO2
In situ preparation 4 cycles of 5x10^-7 mbar NO2 adsorption at 693 K and annealing at 1200 K
Additional Information Preparation initial oxide film: Cleaning: 1.5 keV Ar+ sputtering and annealing at 1300 K. Initial alumina growth: three cycles of 5×10−6mbar O2 exposure at 550 K and subsequent UHV annealing at 1100 K (1050 K in the final cycle).
Dataset Metadata
Measurement Date 29-04-2016
Publication Url https://pubs.acs.org/doi/abs/10.1021/acs.jpcb.7b06790
Measurement conditions
Condition Value Units
Temperature 293 K
Pressure 10^-9 mbar
Contributor Info
Laboratory Catalysis and Surface Chemistry
Instrument Focus 500 x-ray source, Phoibos 100 analyzer
Contributors
Profile picture of Rik Mom
Rik Mom
Owner
Calibration Info
Protocol ISO 15472:2010
Calibration date unknown
Calibration value
Emission line fermi
Suggested Tags

 

O 00 0
No comments added
Al 00 0
No comments added
Ni 00 0
No comments added

Al2O3/NiAl(110) 4 cycles NO2 0
No comments added