| Photon energy | 1486.61eV |
| Spectrum type | C 1s |
| Resolution | 10 |
| Dwell Time | 0.1 |
| Step size | 0.1 |
| Number of scans | 60 |
| Name | Al2O3/NiAl(110) 4 cycles NO2 |
| In situ preparation | 4 cycles of 5x10^-7 mbar NO2 adsorption at 693 K and annealing at 1200 K |
| Additional Information | Preparation initial oxide film: Cleaning: 1.5 keV Ar+ sputtering and annealing at 1300 K. Initial alumina growth: three cycles of 5×10−6mbar O2 exposure at 550 K and subsequent UHV annealing at 1100 K (1050 K in the final cycle). |
| Measurement Date | 29-04-2016 |
| Publication Url | https://pubs.acs.org/doi/abs/10.1021/acs.jpcb.7b06790 |
| Condition | Value | Units |
|---|---|---|
| Temperature | 293 | K |
| Pressure | 10^-9 | mbar |
| Laboratory | Catalysis and Surface Chemistry |
| Instrument | Focus 500 x-ray source, Phoibos 100 analyzer |
| Protocol | ISO 15472:2010 |
| Calibration date | unknown |
| Emission line | fermi |
